Method for cutting substrate

ABSTRACT

A method for cutting a substrate includes: radiating, as part of a first laser radiating process, a laser towards a surface of the substrate to form a first groove in a substrate. Radiating the laser towards the surface includes radiating, in sequence, the laser towards a first outer point (FOP), a second outer point (SOP), a first intermediate point (FIP), a second intermediate point (SIP), and a first cut point (FCP) of the surface, each of the points being spaced apart from one another by one or more distances. The FCP corresponds to a cut line of the substrate. The FOP and the SOP are respectively disposed at lateral sides of the FCP. The FIP is disposed between the FCP and the FOP. The SIP is disposed between the FCP and the SOP. The same kind and intensity of laser is radiated towards each of the points.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority from and the benefit of Korean PatentApplication No. 10-2013-0125422, filed on Oct. 21, 2013, which isincorporated by reference for all purposes as if set forth herein.

BACKGROUND

1. Field

Exemplary embodiments relate to a method for cutting a substrate, and,more particularly, to a method for cutting a substrate using a laser.

2. Discussion

Many different types of flat panel displays are utilized, such as, forexample, liquid crystal display (LCDs), organic light emitting diode(OLED) displays, plasma displays (PDs), field emission displays (FEDs),electrophoretic displays (EPDs), electrowetting displays (EWDs), and thelike. A conventional flat panel display may include a display area todisplay an image and a pad area including a circuit to supply a drivingsignal to the display area. Further, a typical flat panel display mayuse a glass substrate as a base substrate, and, generally, the displayarea may include two substrates, whereas the pad area may include onesubstrate.

Typically, a substrate may have a quadrangular shape, such that a cornerportion of a pad area of the substrate may have an edge that may bevulnerable to external impact. Damage to the substrate due to theexternal impact may be reduced by cutting the substrate corner portionof the pad area. Generally, when the substrate is cut, a laser may beutilized. It is noted that when a surface of the substrate is to be cutby radiating the laser onto the substrate, the laser may be intensivelyradiated onto a first portion of the substrate. In this manner, however,a second portion of the substrate may be affected by an increase in heatdue to the laser radiation. As such, the second portion of the substratemay be damaged.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the inventive concept,and, therefore, it may contain information that does not form the priorart that is already known in this country to a person of ordinary skillin the art.

SUMMARY

Exemplary embodiments provide a method for cutting a substrate that mayreduce the damage to the substrate, which may be caused, at least inpart, by heat transfer associated with laser radiation utilized to cutthe substrate.

Additional aspects will be set forth in the detailed description whichfollows, and, in part, will be apparent from the disclosure, or may belearned by practice of the inventive concept.

According to exemplary embodiments, a method for cutting a substrateincludes: radiating, as part of a first laser radiating process, a lasertowards a surface of the substrate to form a first groove in thesubstrate. Radiating the laser towards the surface includes radiating,in sequence, the laser towards a first outer point, a second outerpoint, a first intermediate point, a second intermediate point, and afirst cut point of the surface. The first outer point, the second outerpoint, the first intermediate point, the second intermediate point, andthe first cut point are spaced apart from one another by one or moredistances. The first cut point corresponds to a cut line of thesubstrate. The first outer point and the second outer point arerespectively disposed at a first lateral side and a second lateral sideof the first cut point. The first intermediate point is disposed betweenthe first cut point and the first outer point. The second intermediatepoint is disposed between the first cut point and the second outerpoint. The same kind of laser and the same intensity of laser isradiated towards each of the first outer point, the second outer point,the first intermediate point, the second intermediate point, and thefirst cut point.

According to exemplary embodiments, it may be possible to reduce thedamage to a substrate, which may otherwise be caused, at least in part,by heat transfer associated with laser radiation utilized to cut thesubstrate. This may be achieved by radiating the laser to a cut line anda plurality of points one or more sides of the cut line rather than onone point of the cut line as part of cutting the substrate using thelaser. It may also be possible to shorten a processing time by radiatingthe same kind of laser to the respective points to receive the laserradiation.

The foregoing general description and the following detailed descriptionare exemplary and explanatory and are intended to provide furtherexplanation of the claimed subject matter.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the inventive concept, and are incorporated in andconstitute a part of this specification, illustrate exemplaryembodiments of the inventive concept, and, together with thedescription, serve to explain principles of the inventive concept.

FIG. 1 is a diagram illustrating a display device, according toexemplary embodiments.

FIG. 2 is a cross-sectional view of the display device of FIG. 1 takenalong sectional line II-II, according to exemplary embodiments.

FIGS. 3, 4, and 5 are diagrams illustrating a method for cutting asubstrate, according to exemplary embodiments.

FIGS. 6, 7, and 8 are diagrams illustrating a method for cutting asubstrate, according to exemplary embodiments.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

In the following description, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of various exemplary embodiments. It is apparent, however,that various exemplary embodiments may be practiced without thesespecific details or with one or more equivalent arrangements. In otherinstances, well-known structures and devices are shown in block diagramform in order to avoid unnecessarily obscuring various exemplaryembodiments.

In the accompanying figures, the size and relative sizes of layers,films, panels, regions, etc., may be exaggerated for clarity anddescriptive purposes. Also, like reference numerals denote likeelements.

When an element or layer is referred to as being “on,” “connected to,”or “coupled to” another element or layer, it may be directly on,connected to, or coupled to the other element or layer or interveningelements or layers may be present. When, however, an element or layer isreferred to as being “directly on,” “directly connected to,” or“directly coupled to” another element or layer, there are no interveningelements or layers present. For the purposes of this disclosure, “atleast one of X, Y, and Z” and “at least one selected from the groupconsisting of X, Y, and Z” may be construed as X only, Y only, Z only,or any combination of two or more of X, Y, and Z, such as, for instance,XYZ, XYY, YZ, and ZZ. Like numbers refer to like elements throughout. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items.

Although the terms first, second, etc. may be used herein to describevarious elements, components, regions, layers, and/or sections, theseelements, components, regions, layers, and/or sections should not belimited by these terms. These terms are used to distinguish one element,component, region, layer, and/or section from another element,component, region, layer, and/or section. Thus, a first element,component, region, layer, and/or section discussed below could be termeda second element, component, region, layer, and/or section withoutdeparting from the teachings of the present disclosure.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like, may be used herein for descriptive purposes, and,thereby, to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the drawings. Spatiallyrelative terms are intended to encompass different orientations of anapparatus in use, operation, and/or manufacture in addition to theorientation depicted in the drawings. For example, if the apparatus inthe drawings is turned over, elements described as “below” or “beneath”other elements or features would then be oriented “above” the otherelements or features. Thus, the exemplary term “below” can encompassboth an orientation of above and below. Furthermore, the apparatus maybe otherwise oriented (e.g., rotated 90 degrees or at otherorientations), and, as such, the spatially relative descriptors usedherein interpreted accordingly.

The terminology used herein is for the purpose of describing particularembodiments and is not intended to be limiting. As used herein, thesingular forms, “a,” “an,” and “the” are intended to include the pluralforms as well, unless the context clearly indicates otherwise. Moreover,the terms “comprises,” comprising,” “includes,” and/or “including,” whenused in this specification, specify the presence of stated features,integers, steps, operations, elements, components, and/or groupsthereof, but do not preclude the presence or addition of one or moreother features, integers, steps, operations, elements, components,and/or groups thereof.

Various exemplary embodiments are described herein with reference tosectional illustrations that are schematic illustrations of idealizedexemplary embodiments and/or intermediate structures. As such,variations from the shapes of the illustrations as a result, forexample, of manufacturing techniques and/or tolerances, are to beexpected. Thus, exemplary embodiments disclosed herein should not beconstrued as limited to the particular illustrated shapes of regions,but are to include deviations in shapes that result from, for instance,manufacturing. For example, an implanted region illustrated as arectangle will, typically, have rounded or curved features and/or agradient of implant concentration at its edges rather than a binarychange from implanted to non-implanted region. Likewise, a buried regionformed by implantation may result in some implantation in the regionbetween the buried region and the surface through which the implantationtakes place. Thus, the regions illustrated in the drawings are schematicin nature and their shapes are not intended to illustrate the actualshape of a region of a device and are not intended to be limiting.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this disclosure is a part. Terms,such as those defined in commonly used dictionaries, should beinterpreted as having a meaning that is consistent with their meaning inthe context of the relevant art and will not be interpreted in anidealized or overly formal sense, unless expressly so defined herein.

FIG. 1 is a diagram illustrating a display device, according toexemplary embodiments. FIG. 2 is a cross-sectional view of the displaydevice of FIG. 1 taken along sectional line II-II.

Referring to FIG. 1, a display device 1000 may include a first displaypanel 100 and a second display panel 200 which face each other. Althoughspecific reference will be made to this particular implementation, it isalso contemplated that display device 1000 may embody many forms andinclude multiple and/or alternative components. For example, it iscontemplated that the components of display device 1000 may be combined,located in separate structures, and/or separate locations.

Although not illustrated, the first display panel 100 may includevarious thin film layers, such as a plurality of thin film transistors,data lines, gate lines, and pixel electrodes, each of which may bedisposed on a substrate 110 made of any suitable material, such as, forexample, transparent glass. The second display panel 200 may alsoinclude one or more thin film layers, such as, for instance, colorfilters (not shown) to enable the display of desired colors while lightpasses through the color filters and a common electrode (notillustrated), each of which may be disposed on a substrate made of anysuitable material, such as, for example, transparent glass. In thismanner, the display device 1000 may include a liquid crystal layer (notshown) disposed between the first display panel 100 and the seconddisplay panel 200.

In exemplary embodiments, the thin film layers of the first displaypanel 100 may include light emitting diodes, which may be disposed onthe substrate 110. As such, the second display panel 200 may be anencapsulation substrate to protect the first display panel 100 includingthe light emitting diodes.

As seen in FIG. 1, the display device 1000 may include a display area Dto display an image and a pad area P disposed outside the display areaD.

The thin film transistors, the data lines, the gate lines, the pixelelectrodes, the common electrode, the liquid crystal layer, and thelike, may be disposed in the display area D to display the imageaccording to a driving signal supplied from one or more components (notshown) disposed in the pad area P. Further, the thin film transistors,the data lines, the gate lines, the light emitting diodes, and the like,may be disposed in the display area D to display the image according toa driving signal supplied from one or more components (not illustrated)disposed in the pad area P. For instance, the one or more components mayform a circuit portion to supply the driving signal to the display areaD. The circuit portion may be disposed in the pad area P.

According to exemplary embodiments, the substrate 110 may includeoblique portions 120 formed at corner portions (e.g., left and rightcorner portions) of the substrate 110 of the first display panel 100 inthe pad area P. The oblique portions 120 may include a first (e.g.,vertically linear) surface 121 extending from a lower surface of thesubstrate 110 towards an upper surface of the substrate 110 and a second(e.g., inclined) surface 122 extending towards the upper surface of thesubstrate 110 from the first surface 121. In this manner, the firstsurface 121 may extend in a first direction, whereas the second surface122 may extend in a second direction crossing the first direction.

It is noted that a conventional substrate may include left and rightcorner portions of the substrate that may form an edge, such that thesubstrate may be damaged due to an external impact when, for instance,the substrate falls or collides with another object. For example, thesubstrate may be damaged when the corresponding display device istransferred between locations and one or more of the corner portionscollide with another object. As such, the corresponding display devicemay also be damaged.

According to exemplary embodiments, however, the oblique portions 120may be formed by cutting the edge portions of the left and right cornerportions of the substrate 110 to reduce the potential for damage to thesubstrate 110, which may be otherwise caused as part of an externalimpact. This may, in turn, reduce the potential for damage to thedisplay device 1000 including the substrate 110.

FIGS. 3 to 5 are diagrams illustrating a method for cutting a substrate,according to exemplary embodiments.

Referring to FIGS. 3 and 4, a first laser radiating process, to form afirst groove 320 by radiating a laser to a first cut point E1, a firstleft outer point A1, a first right outer point B1, a first left middlepoint C1, and a first right middle point D1 of an upper surface of asubstrate 300 made of, for example, glass may be performed. It is notedthat the points C1 and D1 may be disposed at any suitable locationbetween points A1 and E1 or E1 and B1, respectively. In other words,points C1 and D1 may not be “middle” points. To this end, although fiveradiation points are illustrated in FIGS. 3 and 4, it is contemplatedthat any suitable number of radiation points may be utilized.

As part of the first laser radiating process, a laser generated using aneodymium-doped yttrium aluminum garnet (Nd:YAG) lasing medium, aneodymium-doped yttrium lithium fluoride (Nd:YLF) lasing medium, apicosecond laser apparatus, and/or the like, may be used. It is notedthat the laser may employ short pulse laser beams of pulse duration of10 ps (picoseconds) or less.

The first cut point E1 corresponds to a cut line 310, and the first leftouter point A1 and the first right outer point B1 are positioned at theleft and right sides of the first cut point E1, respectively. The firstleft middle point C1 is positioned between the first cut point E1 andthe first left outer point A1, and the first right middle point D1 ispositioned between the first cut point E1 and the first right outerpoint B1. The first cut point E1, the first left outer point A1, thefirst right outer point B1, the first left middle point C1, and thefirst right middle point D1 are spaced apart from each other bydetermined distances, respectively. It is noted that the distancesbetween the respective points A1, B1, C1, D1, and E1 may be the same asor different from each other. It is also contemplated that therespective distances may be variable. For example, the distance betweenA1 and C1 may be the same as the distance from B1 to D1, but may bedifferent from the distance between C1 and E1, which may be the same asthe distance between E1 and D1.

As part of the first laser radiating process, intensities and kinds oflaser beams radiated onto the first cut point E1, the first left outerpoint A1, the first right outer point B1, the first left middle pointC1, and the first right middle point D1 may be the same as each other.To this end, the duration of laser radiation (or amount of laserradiation) onto the first left outer point A1 and the first right outerpoint B1 may be the same as each other, and the duration of laserradiation (or amount of the laser radiation) onto the first left middlepoint C1 and the first right middle point D1 may be the same as eachother. The duration or amount of the laser radiation onto the first cutpoint E1, the first left outer point A1, and the first left middle pointC1 may be different from each other. It is also contemplated that, aspart of the first laser radiating process, the laser may be radiatedonto the first cut point E1, the first left outer point A1, the firstright outer point B1, the first left middle point C1, and the firstright middle point D1 several times. For example, a pulsating laser beammay be utilized to radiate relatively quick bursts of laser radiationonto the points A1 to E1 or a non-pulsating laser beam may be utilized,such that the various points A1 to E1 receive multiple instances ofconstant laser radiation. To this end, any suitable pattern of radiatingthe laser onto the various points A1 to E1 may be utilized.

According to exemplary embodiments, as part of the first laser radiatingprocess, the laser may be radiated, with respect to a total number ofradiation times, by 50% onto the first cut point E1, by 10% onto thefirst left outer point A1 and the first right outer point B1,respectively, and by 15% onto the first left middle point C1 and thefirst right middle point D1, respectively.

It is also contemplated that, in exemplary embodiments, the laser may beradiated onto the first left outer point A1, the first right outer pointB1, the first left middle point C1, the first right middle point D1, andthe first cut point E1 in sequence, as part of the first laser radiationprocess. In this manner, before the laser is radiated onto the firstleft outer point A1, the laser may be radiated onto the first rightouter point B1, and before the laser is radiated onto the first leftmiddle point C1, the laser may be radiated to the first right middlepoint D1. It is also contemplated that laser radiation onto the leftpoints A1 and C1 may occur respectively before the laser radiation ontothe right points B1 and D1. As such, deleterious effects associated withheat generated as part of the laser being radiated onto the substrate300 may be reduced by radiating the laser onto several points ratherthan onto one point. To this end, the deleterious effects may also beremoved (or otherwise mitigated) by radiating the laser according to apattern of radiating events amongst the several points versus onto onepoint for a set duration.

As seen in FIGS. 3 and 4, one first left middle point C1 and one firstright middle point D1 are positioned between the first cut point E1 andthe first left outer point A1 and the first cut point E1 and the firstright outer point B1, respectively. It is contemplated, however, thatone or more points may be positioned between the first cut point E1 andthe first left outer point A1 and the first cut point E1 and the firstright outer point B1.

According to exemplary embodiments, the first groove 320 may be formedhaving a V-shaped cross-section from the upper surface of the substrate300. A depth of the first groove 320 may be largest at a positioncorresponding to the first cut point E1. Further, the depth of the firstgroove 320 may decrease toward the first left outer point A1 and thefirst right outer point B1 from the first cut point E1. Thecross-section of the first groove 320 may be symmetrical about the cutline 310. It is contemplated, however, that any suitable cross-sectionalshape of the first groove 320 may be formed in accordance with exemplaryembodiments described herein.

Referring to FIG. 5, a cut surface 330 may be formed by cutting thesubstrate 300 along the cut line 310 with the first groove 320 havingthe V-shaped cross-section using a cutting apparatus. The cut surface330 includes a first surface (e.g., a vertically linear surface) 311extending from a lower surface of the substrate 300 towards an uppersurface of the substrate 300. Further, the cut surface 330 includes asecond surface (e.g., an inclined surface) 321 extending towards anupper surface of the substrate 300 from the first surface 311. In thismanner, the first surface 311 extends in a first direction and thesecond surface 321 extends in a second direction crossing the firstdirection.

According to exemplary embodiments, by radiating the laser onto the cutline 310 and the plurality of left and right points of the cut line 310rather than onto one point of the cut line 310, it may be possible toprevent (or otherwise reduce) the damage to a substrate, which mayotherwise be caused, at least in part, by heat transfer associated withlaser radiation. Further, it may be possible to shorten a processingtime by radiating the same kind of laser to the respective points A1,B1, C1, D1, and E1.

FIGS. 6 to 8 are diagrams illustrating a method for cutting a substrate,according to exemplary embodiments.

As described above, referring to FIG. 4, the first groove 320 having aV-shaped cross-section may be formed on the upper surface of thesubstrate 300 by performing the first laser radiating process.Subsequently, referring to FIGS. 6 to 8, a second laser radiatingprocess may be performed to form a second groove 320A (see FIG. 7) byradiating a laser to a second cut point E2, a second left outer pointA2, a second right outer point B2, a second left middle point C2, and asecond right middle point D2 of the first groove 320. It is noted thatthe points C2 and D2 may be disposed at any suitable location betweenpoints A2 and E2 or E2 and B2, respectively. In other words, points C2and D2 may not be “middle” points. To this end, although five radiationpoints are illustrated in FIG. 6, it is contemplated that any suitablenumber of radiation points may be utilized.

The cross-section of the second groove 320A may have a V-shape, and maybe symmetrical about the cut line 310. A depth of the second groove 320Amay be larger than the depth of the first groove 320. The depth of thesecond groove 320A may be largest at a position corresponding to thesecond cut point E2. In addition, the depth of the second groove 320Amay decrease toward the second left outer point A2 and the second rightouter point B2 from the second left middle point C2 and the second rightmiddle point D2, respectively. It is contemplated, however, that anysuitable cross-sectional shape of the second groove 320A may be formedin accordance with exemplary embodiments described herein.

The second cut point E2, the second left outer point A2, the secondright outer point B2, the second left middle point C2, and the secondright middle point D2 may be positioned vertically below the first cutpoint E1, the first left outer point A1, the first right outer point B1,the first left middle point C1, and the first right middle point D1,respectively.

According to exemplary embodiments, the second cut point E2, the secondleft outer point A2, the second right outer point B2, the second leftmiddle point C2, and the second right middle point D2 may be spacedapart from each other by determined gaps, respectively. It is noted thatthe distances between the respective points A2, B2, C2, D2, and E2 maybe the same as or different from each other. It is also contemplatedthat the respective distances may be variable. For example, the distancebetween A2 and C2 may be the same as the distance from B2 to D2, but maybe different from the distance between C2 and E2, which may be the sameas the distance between E2 and D2. The distances between the second cutpoint E2, the second left outer point A2, the second right outer pointB2, the second left middle point C2, and the second right middle pointD2 may be the same as the distances between the first cut point E1, thefirst left outer point A1, the first right outer point B1, the firstleft middle point C1, and the first right middle point D1. It is alsocontemplated that the distances may be different.

In exemplary embodiments, the kind of laser used in the second laserradiating process may be the same as the kind of laser used in the firstlaser radiating process. An intensity of the laser used in the secondlaser irradiating process may be larger than the intensity of the laserused in the first laser irradiating process.

As part of the second laser radiating process, the intensities and kindsof lasers radiated onto the second cut point E2, the second left outerpoint A2, the second right outer point B2, the second left middle pointC2, and the second right middle point D2 may be the same as each other,or may be different form one or more of the other intensities and/orkinds of lasers. To this end, the duration (or amount of laserradiation) onto the second left outer point A2 and the second rightouter point B2 may be the same as each other, and the duration (oramount of laser radiation) onto the second left middle point C2 and thesecond right middle point D2 may be the same as each other. The durationor amount of laser radiation onto the second cut point E2, the secondleft outer point A2, and the second left middle point C2 may bedifferent from each other. It is also contemplated that, as part of thesecond laser radiating process, the laser may be radiated onto thesecond cut point E2, the second left outer point A2, the second rightouter point B2, the second left middle point C2, and the second rightmiddle point D2 several times. For example, a pulsating laser beam maybe utilized to radiate relatively quick bursts of laser radiation ontothe points A2 to E2 or a non-pulsating laser beam may be utilized, suchthat the various points A2 to E2 receive multiple instances of constantlaser radiation. To this end, any suitable pattern of radiating thelaser onto the various points A2 to E2 may be utilized.

As part of the second laser radiating process, the laser may be radiatedonto the second left outer point A2, the second right outer point B2,the second left middle point C2, the second right middle point D2, andthe second cut point E2 several times in sequence. In this manner,before the laser is radiated onto the second left outer point A2, thelaser may be radiated onto the second right outer point B2, and beforethe laser is radiated onto the second left middle point C2, the lasermay be radiated onto the second right middle point D2. It is alsocontemplated that laser radiation onto the left points A2 and C2 mayoccur respectively before the laser radiation onto the right points B2and D2.

According to exemplary embodiments, as part of the second laserradiating process, the laser may be radiated, with respect to a totalnumber of radiation times, by 50% onto the second cut point E2, by 10%onto the second left outer point A2 and the second right outer point B2,respectively, and by 15% onto the second left middle point C2 and thesecond right middle point D2, respectively.

In exemplary embodiments, deleterious effects associated with heatgenerated as part of the laser being radiated onto the substrate 300 maybe reduced by radiating the laser onto several points rather than ontoone point. To this end, the deleterious effects may also be removed (orotherwise mitigated) by radiating the laser according to a pattern ofradiating events amongst the several points versus onto one point for aset duration.

Subsequently, a third laser radiating process, which cuts the substrate300 by radiating a laser to a third cut point E3, a third left outerpoint A3, a third right outer point B3, a third left middle point C3,and a third right middle point D3 of the second groove 320A, isperformed. It is noted that the points C3 and D3 may be disposed at anysuitable location between points A3 and E3 or E3 and B3, respectively.In other words, points C3 and D3 may not be “middle” points. To thisend, although five radiation points are illustrated in FIG. 7, it iscontemplated that any suitable number of radiation points may beutilized.

The third cut point E3, the third left outer point A3, the third rightouter point B3, the third left middle point C3, and the third rightmiddle point D3 may be positioned vertically below the second cut pointE2, the second left outer point A2, the second right outer point B2, thesecond left middle point C2, and the second right middle point D2,respectively.

According to exemplary embodiments, the third cut point E3, the thirdleft outer point A3, the third right outer point B3, the third leftmiddle point C3, and the third right middle point D3 may be spaced apartfrom each other by determined gaps, respectively. It is noted that thedistances between the respective points A3, B3, C3, D3, and E3 may bethe same as or different from each other. It is also contemplated thatthe respective distances may be variable. For example, the distancebetween A3 and C3 may be the same as the distance from B3 to D3, but maybe different from the distance between C3 and E3, which may be the sameas the distance between E3 and D3. The distances between the third cutpoint E3, the third left outer point A3, the third right outer point B3,the third left middle point C3, and the third right middle point D3 maybe the same as the distances between the second cut point E2, the secondleft outer point A2, the second right outer point B2, the second leftmiddle point C2, and the second right middle point D2. It is alsocontemplated that the distances may be different.

In exemplary embodiments, the kind of laser used in the third laserradiating process may be the same as the kind of laser used in thesecond laser radiating process. An intensity of the laser used in thethird laser radiating process may be larger than the intensity of thelaser used in the second laser radiating process.

As part of the third laser radiating process, intensities and kinds ofthe lasers radiated to the third cut point E3, the third left outerpoint A3, the third right outer point B3, the third left middle pointC3, and the third right middle point D3 may be the same as each other,or may be different form one or more of the other intensities and/orkinds of lasers. To this end, the duration (or amount of laserradiation) onto the third left outer point A3 and the third right outerpoint B3 may be the same as each other, and the duration (or amount oflaser radiation) onto the third left middle point C3 and the third rightmiddle point D3 may be the same as each other. The duration or amount oflaser radiation onto the third cut point E3, the third left outer pointA3, and the third left middle point C3 may be different from each other.It is also contemplated that, as part of the third laser radiatingprocess, the laser may be radiated onto the third cut point E3, thethird left outer point A3, the third right outer point B3, the thirdleft middle point C3, and the third right middle point D3 several times.For example, a pulsating laser beam may be utilized to radiaterelatively quick bursts of laser radiation onto the points A3 to E3 or anon-pulsating laser beam may be utilized, such that the various pointsA3 to E3 receive multiple instances of constant laser radiation. To thisend, any suitable pattern of radiating the laser onto the various pointsA3 to E3 may be utilized.

In exemplary embodiments, as part of the third laser radiating process,the respective lasers may be radiated onto the third left outer pointA3, the third right outer point B3, the third left middle point C3, thethird right middle point D3, and the third cut point E3 several times insequence. In this manner, before the laser is radiated onto the thirdleft outer point A3, the laser may be radiated onto the third rightouter point B3, and before the laser is radiated onto the third leftmiddle point C3, the laser may be radiated onto the third right middlepoint D3. It is also contemplated that laser radiation onto the leftpoints A3 and C3 may occur respectively before the laser radiation ontothe right points B3 and D3.

According to exemplary embodiments, as part of the third laser radiatingprocess, the laser may be radiated, with respect to a total number ofradiation times, by 50% onto the third cut point E3, by 10% onto thethird left outer point A3 and the third right outer point B3,respectively, and by 15% onto the third left middle point C3 and thethird right middle point D3, respectively.

In exemplary embodiments, the substrate 300 may be cut to form the cutsurface 330 by performing the first, second, and third laser radiatingprocesses. It is also contemplated that the cut surface 330 of thesubstrate 300 may be a curved (or otherwise arcuate) surface connectedfrom the lower surface to the upper surface of the substrate 300 and theupper surface of the substrate 300, such as illustrated in FIG. 8.

According to exemplary embodiments, a laser having larger intensity thanthe laser used in the first laser radiating process may be used in thesecond laser radiating process, and a laser having larger intensity thanthe laser used in the second laser radiating process may be used in thethird laser radiating process. As such, since a high-output laser is notused in an initial cutting stage, that is, in the first laser radiatingprocess, it may be possible to prevent (or otherwise reduce thepotential of) the surface of the substrate 300 from being broken.

Although certain exemplary embodiments and implementations have beendescribed herein, other embodiments and modifications will be apparentfrom this description. Accordingly, the inventive concept is not limitedto such embodiments, but rather to the broader scope of the presentedclaims and various obvious modifications and equivalent arrangements.

What is claimed is:
 1. A method for cutting a substrate, comprising:radiating, as part of a first laser radiating process, a laser towards asurface of the substrate to form a first groove in the surface,radiating a laser towards the surface of the first groove to form asecond groove as part of a second laser radiating process, wherein:radiating the laser towards the surface to form the first groovecomprises radiating, in sequence, the laser towards a first outer point,a second outer point, a first intermediate point, a second intermediatepoint, and a first cut point of the surface, the first outer point, thesecond outer point, the first intermediate point, the secondintermediate point, and the first cut point are spaced apart from oneanother by one or more distances, the first cut point corresponds to acut line of the substrate, the first outer point and the second outerpoint are respectively disposed at a first lateral side and a secondlateral side of the first cut point, the first intermediate point isdisposed between the first cut point and the first outer point, thesecond intermediate point is disposed between the first cut point andthe second outer point, the same kind of laser and the same intensity oflaser is radiated towards each of the first outer point, the secondouter point, the first intermediate point, the second intermediatepoint, and the first cut point, and radiating the laser towards thesurface of the first groove comprises radiating the laser towards asecond cut point, a third outer point, a fourth outer point, a thirdintermediate point, and a fourth intermediate point of the first groove.2. The method for cutting a substrate of claim 1, wherein, with respectto a total number of radiation times of the laser toward the substrate,the laser is radiated 50% of the radiation times toward the first cutpoint, 15% of the radiation times toward the first intermediate point,15% of the radiation times toward the second intermediate point, 10% ofthe radiation times toward the first outer point, and 10% of theradiation times toward the second outer point.
 3. The method for cuttinga substrate of claim 2, wherein: the first groove has a V-shapedcross-section, and the cross-section of the first groove is symmetricalabout the cut line.
 4. The method for cutting a substrate of claim 3,wherein: a depth of the first groove is greatest at a portioncorresponding to the first cut point, and the depth of the first groovedecreases toward each of the first outer point and the second outerpoint.
 5. The method for cutting a substrate of claim 4, wherein thesecond cut point, the third outer point, the fourth outer point, thethird intermediate point, and the fourth intermediate point are disposedbelow the first cut point, the first outer point, the second outerpoint, the first intermediate point, and the second intermediate point,respectively.
 6. The method for cutting a substrate of claim 5, whereinthe kind of laser utilized as part of the first laser radiating processis the same as the kind of laser utilized as part of the second laserradiating process.
 7. The method for cutting a substrate of claim 6,wherein the intensity of the laser radiated as part of the second laserradiating process is greater than the intensity of the laser radiated aspart of the first laser radiating process.
 8. The method for cutting asubstrate of claim 7, wherein: the second laser radiating processcomprises radiating, in sequence, the laser towards the third outerpoint, the fourth outer point, the third intermediate point, the fourthintermediate point, and the second cut point, and the kind of laser andthe intensity of the laser radiated towards the third outer point, thefourth outer point, the third intermediate point, the fourthintermediate point, and the second cut point are the same as oneanother.
 9. The method for cutting a substrate of claim 8, wherein, withrespect to a total number of radiation times of the laser toward thefirst groove, the laser is radiated 50% of the radiation times towardthe second cut point, 15% of the radiation times toward the thirdintermediate point, 15% of the radiation times toward the fourthintermediate point, 10% of the radiation times towards the third outerpoint, and 10% of the radiation times towards the fourth outer point.10. The method for cutting a substrate of claim 9, wherein: the secondgroove has a V-shaped cross-section, and the cross-section of the secondgroove is symmetrical about the cut line.
 11. The method for cutting asubstrate of claim 10, wherein: a depth of the second groove is greaterthan the depth of the first groove, the depth of the second groove isgreatest at a portion corresponding to the second cut point, and thedepth of the second groove decreases toward each of the third outerpoint and the fourth outer point.
 12. The method for cutting a substrateof claim 11, further comprising: radiating, after the second laserradiating process, a laser towards the surface of the second groove tocut the substrate as part of a third laser radiating process, whereinradiating the laser towards the second groove comprises radiating thelaser towards a third cut point, a fifth outer point, a sixth outerpoint, a fifth intermediate point, and a sixth intermediate point of thesecond groove.
 13. The method for cutting a substrate of claim 12,wherein the third cut point, the fifth outer point, the sixth outerpoint, the fifth intermediate point, and the sixth intermediate pointare vertically disposed below the second cut point, the third outerpoint, the fourth outer point, the third intermediate point, and thefourth intermediate point, respectively.
 14. The method for cutting asubstrate of claim 13, wherein the kind of laser utilized as part of thethird laser radiating process is the same as the kind of laser utilizedas part of the second laser radiating process.
 15. The method forcutting a substrate of claim 14, wherein the intensity of the laserradiated as part of the third laser radiating process is greater thanthe intensity of the laser radiated as part of the second laserradiating process.
 16. The method for cutting a substrate of claim 15,wherein: the third laser radiating process comprises radiating, insequence, the laser towards the fifth outer point, the sixth outerpoint, the fifth intermediate point, the sixth intermediate point, andthe third cut point, and the kind of laser and the intensity of thelaser radiated towards the fifth outer point, the sixth outer point, thefifth intermediate point, the sixth intermediate point, and the thirdcut point are the same as one another.
 17. The method for cutting asubstrate of claim 16, wherein, with respect to a total number ofradiation times of the laser toward the second groove, the laser isradiated 50% of the radiation times towards the third cut point, 15% ofthe radiation times toward the fifth intermediate point, 15% of theradiation times towards the sixth intermediate point, 10% of theradiation times towards the fifth outer point, and 10% of the radiationtimes towards the sixth outer point, respectively.
 18. The method forcutting a substrate of claim 1, wherein the cut surface of the substratecomprises: a first surface extending in a first direction from a lowersurface of the substrate towards the surface of the substrate, thesurface being an upper surface; and a second surface extending in asecond direction from the first surface towards the upper surface of thesubstrate, the second direction crossing the first direction.